Refrigeration Engineering and Technology

ISSN-print:0453-8307
ISSN-online:2409-6792
ISO:26324:2012

Gas Velosity and Mass Flowrate Scaling Modeling in Microelectronics’ Thermal Control Systems

DOI: 10.15673/ret.v53i6.923 (eng)

  • B. V. Kosoy
  • Y. Utaka

Abstract | Full Text: In the present research we investigate pressure driven flow in the transition and free-molecular flow regimes with the objective of developing unified flow models for microchannels. These models are based on a velocity scaling law, which is valid for a wide range of Knudsen number. Simple slip-based descriptions of flowrate in microchannels are corrected for effects in the transition and free-molecular flow regimes with the introduction of a rarefaction factor. The resulting models can predict the velocity distribution, mass flowrate, pressure and shear stress distribution in rectangular microchannels in the entire Knudsen flow regime.

Keywords:

  • Flow
  • Microchannel
  • Model
  • Velocity Scaling Law
  • Knudsen Flow Regime
  • Flowrate Scaling
  • Microelectronics Thermal Control Systems